Specification

Vacuum chamber	Aluminum alloy 1550mm (forming room rough size)
Substrate dome	Rotatable dome / Rotating / Rotating type dome
Substrate heating	Sheath heater
Evaporation source	270˚ deflective electron gun
Source of Assist	Pressure inclination type plasma gun
Hearth	24 points (44mm melting pots) / Ring shape hearth
Film deposition control	Film thickness / deposition speed control Percolation type optical film thickness gauge (multi-wave length control method) Crystal type film thickness gauge plus 6 point sensor Film pressure control Plasma control
Vacuum gauge	Combined type vacuum gauge plus Pirani gauge
Vacuum exhaust	Diffusion pump Rotary pump Mechanical booster Cryotrap
Target pressure	10-5 Pa’s
Exhaust time	15 minutes until 1.5 x 10-3 Pa’s

Equipment features

• By using a plasma gun with the pressure inclination type discharge method, even in the comparatively low pressure range of 10^-3Pa's, a large current plasma of over 100A, the most suitable low voltage for generation, is created.
• With large current plasma, high assist energy and promotion of the ionization of materials occur, thus it makes also highly reactive, high-speed film deposition possible.
• Due to ions in the plasma spreading without directivity, it is possible to have large area assist on three dimensional objects such as concave surfaces.
• Automatic stability control of plasma assist forming condition

* We handle the installation and modification of plasma guns to existing equipment

Application samples

1. Metal oxide layer
2. Metal nitride layer
3. Transparent conductive layer
4. Metal layer

Assist deposition

Plasma radiation

Rotatable substrate dome

Application samples

Optical characteristics of IR cut filter

Optical characteristics of cold mirror

SEM observation (Cross section)

* Detailed information is also given in “Technical Data.”