Tsukishima Kikai, from its establishment, has grown together with vacuum technology. Reduced pressure concentration technology is used for large plant equipment. (From atmospheric pressure to approx 1 torr)
In the 1970s, we introduced electron beam welding equipment (EBW) which to this day continues to fully operate. (at 102 Pa's)
The chamber for EBW has been manufactured by us.
In late 1980s, we developed plasma polymerization technology and achieved the hard coating of resin surfaces. (at 104 Pa’s)
In early 1990s, we developed alumina-thin film forming technology by reactive ion plating equipment. (at 106 Pa’s)
In 1999, we delivered multi-sputter equipment for hard disc head to the laboratory of Prof. Migaku Takahashi at Tohoku University. (at 108 Pa’s)
We have responded to various needs of the days from low to ultrahigh vacuum technologies.
