Our activity
Vacuum Coating systems
- Vapor Deposition systems
Plasma-assisted vapor deposition system
- Sputtering systems
Multi source sputtering system
Sputtering system in Ultra-high vacuum
- PECVD systems
RF PECVD system
Plasma polymerization
Production & Manufacturing
Vacuum coating equipments
Vacuum chamber
Application
Information & Communication
Optics
Energy
Food & Beverages
TSK's Key Technologies
Metal Oxide layer (SiO2, TiO2, ZrO,etc.)
Metal Nitride layer (SiN, TiN, etc.)
Transparent Conductive layer (ITO, ZnO)
Barrier Coatings
Large size Vacuum chamber (Electron Beam Welding)
TSK supplies the production equipment required including technologies appropriate for vacuum coatings.
Plasma-assisted vapor deposition system
Multi-Sputtering equipment in ultra-high vacuum for Tohoku Univ.
